The FE-1050 series field emission scanning electron microscope is the first flagship model from Leading Systems in China. Powered by a new generation of electron optics, it boasts superior performance with low voltage and high resolution. With 27 ports for expansion and a large chamber, it easily handles various imaging and analysis needs. Simplified operation, automated interaction, and intelligent feature recognition and statistics significantly improve work efficiency. Lifetime after-sales guarantee and 24/7 support are provided.
The FE-1050 series high-resolution (field emission) scanning electron microscope is equipped with a new generation of electron optical column, featuring superior electron optical performance. It has been particularly optimized for high resolution at low voltages, achieving 1.5nm (1kV), allowing for easy observation of samples that are susceptible to electron irradiation damage.
Features:
1) High resolution at low voltage
2) Up to 27 accessory ports, making it one of the most scalable scanning electron microscopes currently available
3) Large chamber for easy adaptation to third-party accessories
4) Intelligent anti-collision
5) One-click automatic sample delivery
6) Automatic electronic alignment
7) Real-time focus tracking
Parameters:
1. Electron Optical System
| Parameter | Specification |
|---|---|
| Electron Gun | Schottky field emission type |
| Objective Lens Type | Non-immersion electromagnetic compound lens |
| Accelerating Voltage | 0.02 ~ 30 kV |
| Probe Current | 10 pA to 30 nA (100 nA optional) |
| Magnification | 10× – 1,000,000× |
| SE Resolution | 1.5 nm (1 kV), 0.9 nm (15 kV) |
| BSE (optional) | 2.5 nm (1 kV), 1.5 nm (15 kV) |
| STEM | 0.8 nm (30 kV) |
2. Vacuum System
| Parameter | Specification |
|---|---|
| Ion Pump (IGP) | 25 L/s + 2×20 L/s |
| Turbomolecular Pump (TMP) | 250 L/s (N₂) |
| Roughing Pump | 15 m³/h mechanical pump, oil-free scroll pump (optional) |
| Electron Gun Vacuum | < 1.0×10⁻⁷ Pa |
| Main Specimen Chamber Ultimate Vacuum | < 1.0×10⁻⁴ Pa |
| Number of Chamber Ports | 27 |
| Air Lock (Pre-chamber) | Automatic sample transfer for 50 mm sample tray |
| Optical Rail for Pre-chamber | Automatic sample transfer for 4/6 inch wafer (optional) |
| Optical Rail for Pre-chamber (duplicate line removed as per original) | Optical rail for pre-chamber |
3. Specimen Stage
| Parameter | Specification |
|---|---|
| X | 140 mm |
| Y | 140 mm |
| Z | 60 mm |
| R | Continuous 360° |
| T | -10° ~ +80° |
| Repeatability (X/Y/Z) | ≤ 1 µm (optional) |
| Maximum Sample Load | 5 kg |
Soloutions:
In the field of materials science, scanning electron microscopy (SEM) plays a crucial role, widely applied in research on the morphology, structure, interface conditions, damage mechanisms, and performance prediction of various materials.
SEM allows for direct study of crystal defects and their manufacturing processes, observation of atomic aggregation patterns and true boundaries within metallic materials, observation of boundary movement under different conditions, and examination of damage caused by surface machining and radiation. We also provide specialized solutions for composite materials such as ceramics, fibers, films, metals, alloys, polymers, and plastics.